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Iron sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis), Thermo Scientific Chemicals
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Quantity:
1 Ea.
Description
Iron sputtering target is used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.
Specifications
| Quantity | 1 Ea. |
| Solubility Information | Insoluble in water. |
| Percent Purity | 99.95% |
| Assay | (metals basis) |
| Chemical Name or Material | Iron sputtering target, 50.8mm (2.0 in.) dia. x 6.35mm (0.250 in.) thick |
Safety and Handling
| Hazard Category | H500 |
| EINECSNumber | 231-096-4 |
| TSCA | Yes |
| Recommended Storage | Ambient temperatures |
RUO – Research Use Only
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