Silicon sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.999% (metals basis), Thermo Scientific Chemicals

Description

 

Silicon sputtering target in ultra high purity silicon is used in the semiconductor industry as a result of its semiconducting properties. It is used as an alloying element in the manufacture of certain alloys (e.g. ferrosilicon, an alloy of iron and silicon which is used to introduce silicon into steel and cast iron). It is also used in the manufacture of glass and computer microchips.

This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.

Specifications

Chemical Identifiers

• CAS: 7440-21-3
• Molecular Formula: Si
• Molecular Weight (g/mol): 28.09
• MDL Number: MFCD00085311
• InChI Key: XUIMIQQOPSSXEZ-UHFFFAOYSA-N
• Synonym: metal, silicone, defoamer s-10, flots 100sco, powder, dust, unii-z4152n8iui, polyeristalline powder, ccris 6599, ccris 6831
• PubChem CID: 5461123
• ChEBI: CHEBI:27573
• IUPAC Name: silicon
• SMILES: [Si]

• Quantity: 1 Ea.
• Odor: Odorless
• Solubility Information: Insoluble in water.
• Percent Purity: 99.999%
• Assay: (metals basis)
• Chemical Name or Material: Silicon sputtering target, 50.8mm (2.0 in.) dia. x 6.35mm (0.250 in.) thick

Safety and Handling

EINECSNumber	231-130-8
TSCA	Yes
Recommended Storage	Ambient temperatures

SDS

RUO – Research Use Only